Screen Printed Fire-Through Contact Formation for Polysilicon-Passivated Contacts and Phosphorus-Diffused Contacts

In this article, we investigate the passivation quality and electrical contact properties for samples with a 150 nm thick n + polysilicon layer in comparison to phosphorus diffused layer. High level of is achieved an interfacial oxide underneath it. The screen-printed fire-through silver paste are excellent (no additional recombination from metallization specific resistivity (ρ c ) ≤ 2 mΩ·cm xmlns:xlink="http://www.w3.org/1999/xlink">2 layers. Fast-firing peak temperature was varied during formation process; done see trend change thermal budget. differences J xmlns:xlink="http://www.w3.org/1999/xlink">0met xmlns:xlink="http://www.w3.org/1999/xlink">ρc two different kinds explained help high-resolution scanning electron microscope imaging. Finally, prepare M2-sized n-passivated emitter rear totally (PERT) solar cells based passivated contact. best cell efficiency 21.64%, V xmlns:xlink="http://www.w3.org/1999/xlink">oc 686 mV fill factor 80.2%.